| Technical parameters | Cov khoom raug cais | Qauv | Qhov nruab nrab particle loj (nm) | Purity (%) | Qhov chaw tshwj xeeb (m2 / g) | Qhov ceev (g / cm3) | Polymorphs | Xim | | Nanoscale | TXC-001 | 100 | > 99.0 | 32.8 ib | 3.10 | Lub voos xwmfab | Xim av-dub | | Submicron | TXC-002 | 800 | > 99.8 | 8.38 ib | 4.10 | Lub voos xwmfab | Xim av xim av | Cov yam ntxwv tseem ceeb ntawmnano-tantalum carbide ultrafine tantalum carbide hmoov npaj los ntawm cov txheej txheem tshwj xeeb, cov hmoov particle loj uniformity, yooj yim dispersed, nyuaj thiab qhov zoo yog qhov tseem ceeb, siab tshuaj stability thiab zoo kub zoo, muaj zog antioxidant muaj peev xwm, hluav taws xob conductivity ntawm tus zoo.Qhov ceev 14.5g / cm3 melting point 38750C, lub boiling point ntawm 55000C.TANBIDE ultrafine hmoov yog ib qho tseem ceeb ceramic, vc, crada carbides loj, vc, crada carbides ntawm cov coarse nplej ultrafine lis alloys, xws li cov cuab yeej mining, los yog round tuav yuav tsum xaiv qhov tsawg tsawg hlau carbide particle loj yog me me ntawm cov hlau tsis tshua muaj carbides vim yog ntxiv, nws nyuam qhuav pib kho WC grain loj thiab txhim kho lub koom haum qauv, thiab yog li, kev cia siab. tias cov nyhuv additive ntawm lub finer lub dispersion ntau Haojiu Hang.Tshwj xeeb tshaj yog rau puag ncig tuav thiab lwm yam ultra-nplua grain alloy, yog hais tias tus additive yog ntxhib heev, tab sis tsim ntawm alloy folder tuab, ces ntawm chav kawm nws tsis tsim nyog.
Daim ntawv thov
1 nm tantalum carbide ultrafine tantalum carbide hmoov siv hauv hmoov metallurgy, txiav cov cuab yeej, nplua ceramics, tshuaj vapor deposition, nyuaj hnav-resistant alloy additives los txhim kho lub toughness ntawm cov alloy;
2 nm tantalum carbide ultrafine tantalum carbide hmoov, tungsten raws li alloy lis refiner, tuaj yeem txhim kho cov khoom hlau zoo. |
